天发娱乐棋牌_天发娱乐APP-官网|下载 facilities | Zepler Cleanrooms | University of 天发娱乐棋牌_天发娱乐APP-官网|下载_天发娱乐棋牌_天发娱乐APP-官网|下载

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Zepler Cleanrooms

The Zepler Cleanrooms complex includes a variety of facilities and laboratories for materials and device research in electronics, photonics and nanotechnology.

Nanofabrication cleanrooms

The 天发娱乐棋牌_天发娱乐APP-官网|下载 Nanofabrication Centre houses a fully featured suite of semiconductor processing tools up to 200 millimetre wafer scale.

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Deep-ultraviolet projection lithography facility

天发娱乐棋牌_天发娱乐APP-官网|下载 deep-ultraviolet scanner is a unique capability within UK academic research. It gives a 248 nanometre (nm) laser source, which gives a critical dimension of 180nm over a 200 millimetre wafer. It has a throughput of 120 wafers per hour.

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Electron beam lithography facility

天发娱乐棋牌_天发娱乐APP-官网|下载 electron beam lithography facility creates new opportunities for fine-geometry capability in novel device fabrication, across electronics, photonics, and bio-nano technology.

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Focused ion beam facility

We specialise in rapid nanostructuring of materials and devices, from nanomembranes to semiconductor multilayer structures and optical fibres for nanophotonics, electronics, metamaterials and plasmonics research.

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Silica fibre facility

We specialise in the manufacture and research of doped and structured fibres.

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Novel and compound glass facility

We offer specialised glass making using glovebox systems for batching, melting, annealing and casting of glass under dry inert atmosphere.

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Flame hydrolysis deposition facility

We deposit optical fibre grade glass on silicon wafers, from 1 to 100 micrometres thickness.

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Hybrid materials and devices facility

We specialise in processing and characterisation of thin film materials from solution, such as those employed in flexible or wearable optoelectronic devices and battery research.

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